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Journal of Electron Microscopy 43(6): 356-360 (1994)
© 1994 Oxford University Press

Reconstruction of LSI Concave Microstructures by Parameter Sensitivity Search in the Best-Fitting Method

Koji Nakamae, Hiroshi Sugimoto and Hiromu Fujioka

Department of Information Systems Engineering, Faculty of Engineering, Osaka University Yamada-Oka 2-1, Suita, Osaka, 565 Japan

A parameter sensitivity search in the best-fitting method for the reconstruction of LSI micrometer-size concave structures is proposed. The sensitivity of the parameter to the objective function to be minimized is investigated in the model that approximates the cross section of the groove photoresist pattern. In the parameter sensitivity search, the best-fitting parameters are determined in the order of decreasing sensitivity by fitting the analytical secondary electron intensity profile for an assumed concave pattern to the experimental secondary electron intensity profile. To evaluate the parameter sensitivity search algorithm, the groove profile is reconstructed from the simulated secondary electron intensity profile with noise. The results show that the calculation time in the proposed algorithm is short by a factor of 2 to 3 compared with that in the downhill simplex method. The algorithm is applied to the experimental secondary electron intensity profiles obtained from the photoresist groove patterns that were formed with the exposure time and the focus of the exposure system as parameters. Reconstructed results illustrate the topographical feature corresponding to the exposure conditions of photoresist patterns.

Keywords     reconstruction, parameter sensitivity search, secondary electron intensity profile, best-fitting method, photoresist pattern

Received      9 May 1994, accepted 11 October 1994


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