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Journal of Electron Microscopy 47(5): 471-476 (1998)
© 1998 Oxford University Press

A fully automated measurement of a hole pattern using image processing technique

F. Komatsu, K. Tsubusaki, H. Motoki and M. Miyoshi

Toshiba Corp. Integrated Circuit Advanced Process Technology Department 8, Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan E-mail: f-komatsu{at}amc.toshiba.co.jp

In this paper, we propose a critical dimension (CD) measurement method which has the advantages for a hole pattern. Image processing techniques such as histogram, three valued processing, contraction and expansion, labelling, and extraction of periphery of a hole pattern are carried out using DSP-II. Two-dimensional automated measurement of the diameter of a hole pattern derived from the area and the perimeter can be achieved within a repeatability (3{sigma}) of 9 nm for a circular-shaped hole pattern and 10 nm for the simultaneous measurement of the major and minor axes of an elliptical-shaped hole pattern of actual devices. A fully automated CD measurement of a hole pattern can be realized without the need to align the scan direction to that of diameter to be measured. The present measurement method can determine the area and the perimeter of the target hole pattern as well as the diameter. These parameters of a hole pattern can be much effective in the evaluation of the geometrical dimension factor.

Keywords     hole pattern, CD measurement, image processing, area and perimeter

Received     13 January 1998, accepted 26 June 1998


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