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Journal of Electron Microscopy 48(5): 561-568 (1999)
© 1999 Oxford University Press

Advanced form of {xi}-factor method in analytical electron microscopy

Takeshi Fujita1, Masashi Watanabe2, Zenji Horita1 and Minoru Nemoto1

1Department of Materials Science and Engineering, Faculty of Engineering 36, Kyushu University Fukuoka 812-8581, Japan
2High Voltage Electron Microscopy Laboratory, Kyushu University Fukuoka 812-8581, Japan

This study describes development of the {xi}-factor method proposed earlier. The development is attempted by incorporating the absorption correction term into the equation relating the mass thickness to the characteristic X-ray intensity. It is shown that the advanced form of the {xi}-factor method reduces restriction encountered by the earlier form and thus enhances applicability of the {xi}-factor method. The advanced form is applied to the Ni-Al binary system and the Ti-Al-Cr ternary system. This application demonstrates the validity of the advanced form of the {xi}-factor method. The relation between the factor and the {xi} factor is discussed and an advantage of using the {xi}-factor method is summarized.

Keywords     quantitative microanalysis, absorption correction, thickness determination, k factor, Ni-Al system, Ni-Al system, Ti-Al-Cr system

Received     19 January 1999, accepted 21 June 1999


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