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Journal of Electron Microscopy 48(5): 595-600 (1999)
© 1999 Oxford University Press

Magnetic microstructure of NiFe/Cu/NiFe films observed by Lorentz microscopy

Kouichi Hamada, Maki Chimura1, Masashi Arita*, Iwao Ishida and Akira Okada

National Research Institute for Metal 1–13 Sakura, Tsukuba, Ibaraki 305–0003, Japan

*To whom correspondence should be addressed: Advanced Materials Science, Electronics and Information Engineering, Graduate School of Engineering, Hokkaido University, Sapporo 060–8628, Japan. E-mail: arita{at}nano.eng.hokudai.ac.jp

1Present address: Kawasaki Heavy Industry Akashi, 673-8666, Japan

Magnetic microstructures of NiFe/Cu/NiFe tri-layer films were observed by means of Lorentz microscopy. The in situ observations in the magnetic field were carried out by simply tilting the films inside a transmission electron microscope. Using the domain wall contrast and the ripple contrast as a guide, the magnetic microstructures of adjacent NiFe layers could be analysed separately. The change of the magnetic microstructure corresponded to the magnetization curve and the suitability of the present method was confirmed. The angle distribution of magnetic moments belonging to adjacent NiFe layers was determined in each Lorentz image, and it was expected that the magnetoresistance ratio changed place by place in the film.

Keywords     Lorentz microscopy, magnetic microstructure, NiFe/Cu/NiFe, giant mag-netoresistance

Received     30 November 1998, accepted 27 April 1999


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