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Journal of Electron Microscopy 48(5): 617-620 (1999)
© 1999 Oxford University Press

A general expression of beam intensity distribution subjected to spherical aberration

Tohru Ishitani

Beam Technology Center, Instruments Hitachi, Ltd., 882 Ichige, Hitachinaka 312–8504, Japan. E-mail: ishitani{at}cm.naka.hitachi.co.jp

Effects of spherical aberration on the geometrical distribution of beam intensity were studied in the probe focusing system using a point object. A general expression on the intensity distribution j(r) is analytically derived as a function of depth in the Gaussian image. The j(r) expression has been shown generally valid for over- and under-focused beams as well as for a just focused beams as well as for a just focused beam, the j(r) profile is inversely proportional to r4/3.

Keywords     spherical aberration, beam intensity distribution, lens, electron optics, ion optics

Received     18 May 1999, accepted 6 July 1999


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