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Journal of Electron Microscopy Advance Access originally published online on March 1, 2006
Journal of Electron Microscopy 2006 55(1):23-26; doi:10.1093/jmicro/dfl001
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© The Author 2006. Published by Oxford University Press on behalf of Japanese Society of Microscopy. All rights reserved. For permissions, please email: journals.permissions@oxfordjournals.org

Removing focused ion-beam damages on transmission electron microscopy specimens by using a plasma cleaner

Satoshi Hata1,*, Harini Sosiati2,3, Noriyuki Kuwano3, Masaru Itakura1, Takayoshi Nakano4 and Yukichi Umakoshi4

1 Department of Applied Science for Electronics and Materials, Kyushu University Kasuga, Fukuoka 816-8580, Japan
2 The Research Laboratory for High Voltage Electron Microscopy, Kyushu University Fukuoka, Fukuoka 812-8581, Japan
3 Art, Science and Technology Center for Cooperative Research, Kyushu University Kasuga, Fukuoka 816-8580, Japan
4 Division of Materials & Manufacturing Science, Graduate School of Engineering, Osaka University Suita, Osaka 565-0871, Japan

*To whom correspondence should be addressed. E-mail: hata{at}asem.kyushu-u.ac.jp

A plasma cleaner is usually used for removing carbonaceous debris from a specimen and preventing contamination during transmission electron microscopy (TEM) imaging and analysis. However, the plasma cleaner can be effectively used for thinning down damage layers on TEM specimens prepared by focused ion-beam (FIB) milling. By optimizing plasma treatment conditions, the quality of high-resolution images and diffraction patterns of the FIB-milled specimens has been remarkably improved using the plasma cleaner.

Keywords     focused ion beam, surface damage, plasma cleaner, transmission electron microscopy

Received     19 May 2005, accepted 26 January 2006


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