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Journal of Electron Microscopy Advance Access originally published online on January 12, 2007
Journal of Electron Microscopy 2006 55(6):273-280; doi:10.1093/jmicro/dfl037
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© The Author 2006. Published by Oxford University Press on behalf of Japanese Society of Microscopy. All rights reserved. For permissions, please email: journals.permissions@oxfordjournals.org

The fabrication and application of Zernike electrostatic phase plate

Sen-Hui Huang1,*, Wan-Jhih Wang1, Chia-Seng Chang2, Yeu-Kuang Hwu2, Fan-Gang Tseng3, Ji-Jung Kai1 and Fu-Rong Chen1,2,4

1 Department of Engineering and System Science, Center for Electron Microscopy, National Tsing-Hua University HsinChu 30043
2 Institute of Physics, Academia Sinica Nankang 11529, Taipei
3 Institute of Microelectromechanical System, National Tsing-Hua University HsinChu 30043
4 National Synchrotron Radiation Research Center HsinChu 30076, Taiwan, Republic of China

*To whom correspondence should be addressed. E-mail: d9511815{at}oz.nthu.edu.tw

The Zernike electrostatic phase plate (ZEPP) consisting of three ring electrodes and two insulating rings has been fabricated using Micro Electro-Mechanical System processes. The electrostatic field produced in the phase plate was measured by electrostatic force microscopy. The electrostatic field and focal length of the phase plate is calculated using electron optics principles. The comparison of the experimental electrostatic field and the theoretical calculated is discussed. Finally, we report the application of ZEPP to enhance contrast of the SiONx/SiO2 interface in an NMOS semiconductor device. The quantitative analysis of the contrast enhancement versus the applied bias is discussed in detail.

Keywords     Zernike electrostatic phase plate, electrostatic force microscope, phase contrast, phase-shifting device, Einzel lens, Rose criterion

Received      4 December 2006, accepted 8 December 2006


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