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Journal of Electron Microscopy Advance Access originally published online on February 2, 2007
Journal of Electron Microscopy 2007 56(1):17-20; doi:10.1093/jmicro/dfl043
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© The Author 2007. Published by Oxford University Press on behalf of Japanese Society of Microscopy. All rights reserved. For permissions, please email: journals.permissions@oxfordjournals.org

Development of dedicated STEM with high stability

Koji Kimoto1,*, Kuniyasu Nakamura2, Shinji Aizawa2, Shigeto Isakozawa2 and Yoshio Matsui1

1 National Institute for Materials Science, 1-1 Namiki Tsukukba, Ibaraki 305-0044, Japan
2 Hitachi High-Technologies Corporation, 882 Ichige Hitachinaka, Ibaraki 312-8504, Japan

*To whom correspondence should be addressed. E-mail: kimoto.koji{at}nims.go.jp

We developed a dedicated scanning transmission electron microscope with high-stability. The mechanical and electronic stabilities of the microscope were substantially improved, e.g. the specimen drift rate was found to be <0.2 nm min–1. The Fourier transform of an ADF image showed spots of 0.105 nm at an acceleration voltage of 200 kV without spherical aberration corrector. The stabilized STEM instrument allows us to acquire distortion-free STEM images and high-signal to noise ratio analyses. We have shown the outline of the instrument and preliminary results.

Keywords     Scanning transmission electron microscopy, electron energy loss spectroscopy, cold field-emission electron gun, annular dark field

Received      6 October 2006, accepted 29 December 2006


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[Abstract] [Full Text] [PDF]


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