Skip Navigation

This Article
Right arrow Full Text (PDF)
Right arrow Alert me when this article is cited
Right arrow Alert me if a correction is posted
Services
Right arrow Email this article to a friend
Right arrow Similar articles in this journal
Right arrow Alert me to new issues of the journal
Right arrow Add to My Personal Archive
Right arrow Download to citation manager
Right arrow Search for citing articles in:
ISI Web of Science (8)
Right arrowRequest Permissions
Google Scholar
Right arrow Articles by Jenkins, M. L.
Right arrow Articles by Fukushima, H.
Right arrow Search for Related Content
PubMed
Right arrow Articles by Jenkins, M. L.
Right arrow Articles by Fukushima, H.
Social Bookmarking
 Add to CiteULike   Add to Connotea   Add to Del.icio.us  
What's this?

Journal of Electron Microscopy 48(4): 323-332 (1999)
© 1999 Oxford University Press

On the application of the weak-beam technique to the determination of the sizes of small point-defect clusters in ion-irradiated copper

Michael L. Jenkins1,*, Marquis A. Kirk2 and Hiroshi Fukushima3

1Department of Materials, University of Oxford Parks Road, Oxford 0X1 3PH, UK
2Materials Science Division, Argonne National Laboratory IL 60439, USA
3Faculty of Engineering, Hiroshima University Higashi-Hiroshima 739-8527, Japan

*To whom correspondence should be addressed. E-mail: mike.jenkins{at}materials.oxford.ac.uk

We have made an analysis of the conditions necessary for the successful use of the weak-beam technique for identifying and characterizing small point-defect clusters in ion-irradiated copper. The visibility of small defects was found to depend only weakly on the beam convergence. In general, the image sizes of small clusters were found to be most sensitive to the magnitude of sg, with the image sizes of some individual defects changing by large amounts with changes in sg as small as 0.025 nm–1. The most reliable information on the true defect size is likely to be obtained by taking a series of 5–9 micrographs with a systematic variation of deviation parameter from 0.2–0.3 nm–1. This procedure allows size information to be obtained down to a resolution limit of about 0.5 nm for defects situated throughout a foil thickness of 60 nm. The technique has been applied to the determination of changes in the sizes of small defects produced by a low-temperature in-situ irradiation and annealing experiment.

Keywords     weak-beam microscopy, defects, clusters, irradiation damage

Received     16 October 1998, accepted 23 March 1999


Add to CiteULike CiteULike   Add to Connotea Connotea   Add to Del.icio.us Del.icio.us    What's this?




Disclaimer: Please note that abstracts for content published before 1996 were created through digital scanning and may therefore not exactly replicate the text of the original print issues. All efforts have been made to ensure accuracy, but the Publisher will not be held responsible for any remaining inaccuracies. If you require any further clarification, please contact our Customer Services Department.