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Journal of Electron Microscopy Advance Access originally published online on March 5, 2009
Journal of Electron Microscopy 2009 58(3):123-130; doi:10.1093/jmicro/dfp015
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© The Author 2009. Published by Oxford University Press on behalf of Japanese Society of Microscopy. All rights reserved. For permissions, please e-mail: journals.permissions@oxfordjournals.org

This article appears in the following Journal of Electron Microscopy issue: Special number: Advanced electron microscopy in materials physics [View the issue table of contents]

Control of parasitic aberrations in multipole optics

Philip E. Batson

IBM Thomas J. Watson Research Center, Route 134, Yorktown Heights, New York 10598, USA

To whom correspondence should be addresserd. E-mail: batson{at}us.ibm.com

A method is described to find the optimal fourth order setup of a quadrupole–octupole third-order aberration corrector. Given accurate measurements of aberrations to fifth order, stimulus/response experiments can be used to synthesize pure controls for each measured aberration up to fourth order, including those which are caused by parasitic effects – symmetry violations, misalignments, construction mistakes, post-construction drift or other problems.

Keywords     aberration correction, STEM, multipole optics

Received     15 October 2008, accepted 10 February 2009


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