Journal of Electron Microscopy Advance Access published online on February 2, 2007
Journal of Electron Microscopy, doi:10.1093/jmicro/dfl043
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1 National Institute for Materials Science, 1-1 Namiki, Tsukukba, Ibaraki 305-0044, Japan
* To whom correspondence should be addressed. We developed a dedicated scanning transmission electron microscope with high-stability. The mechanical and electronic stabilities of the microscope were substantially improved, e.g. the specimen drift rate was found to be <0.2 nm min-1. The Fourier transform of an ADF image showed spots of 0.105 nm at an acceleration voltage of 200 kV without spherical aberration corrector. The stabilized STEM instrument allows us to acquire distortion-free STEM images and high-signal to noise ratio analyses. We have shown the outline of the instrument and preliminary results.
Received October 6, 2006
Accepted December 29, 2006
Physical: Notes
Development of dedicated STEM with high stability
Koji Kimoto 1 *, Kuniyasu Nakamura 2, Shinji Aizawa 2, Shigeto Isakozawa 2, and Yoshio Matsui 1
2 Hitachi High-Technologies Corporation, 882 Ichige, Hitachinaka, Ibaraki 312-8504, Japan
Koji Kimoto, E-mail: kimoto.koji{at}nims.go.jp
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