Cover Caption
SIM images showing a typical sample preparation sequence for the in situ observation of the interface reaction. (a) The sampling area. (b) After the W-deposition. (c) After the sputtering of surrounding area. (d) After cutting of the bottom. (e) Picking out from the substrate. (f) Attaching to the filament. (g) The space between the sample and the filament, after filling with the W-deposition. (h) After thinning.
Tanigaki T, Ito K, Nagakubo Y, Asakawa T and Kanemura T (2009) An in situ heating TEM analysis method for an interface reaction. Journal of Electron Mircoscopy 58: 281.
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